Nano Cerium(IV) oxide, Ceric Dioxide Nanoparticle 50nm CeO2 Cerium oxide Maka Polishing

Nkọwa dị mkpirikpi:

Cerium(IV) oxide, nke a makwaara dị ka ceric oxide, ceric dioxide, ceria, cerium oxide ma ọ bụ cerium dioxide, bụ oxide nke cerium metal na-adịghị ahụkebe.A na-ejikarị ntụ ntụ Nano CeO2 eme ihe maka polishing, catalyst, additives, ultraviolet absorbent.


Nkọwa ngwaahịa

Nano Cerium(IV) oxide, Ceric Dioxide Nanoparticle 50nm CeO2 Cerium oxide Maka Polishing

Nkọwapụta:

Aha Cerium (IV) oxide, Ceric Dioxide, Cerium oxide nanopowder
Usoro CeO2
CAS Mba. 1306-38-3
Nha urughuru 50nm
Ịdị ọcha 99.9%
Ọdịdị Ntụ ntụ edo edo dị ọkụ
ngwugwu 1kg,5kg kwa akpa ma ọ bụ dị ka achọrọ
Ngwa isi Catalyst, polishing, additives, ultraviolet abosorbent, wdg.
Mgbasa Enwere ike ịhazi ya

Nkọwa:

Ngwa nke cerium dioxide/CeO2 nanoparticle:

(1) Ceric dioxide nanopowder maka polishing: Nano cerium oxide bụ ugbu a nke a na-ejikarị eme ihe maka ihicha iko.A na-eji ya eme ihe n'ụzọ ziri ezi nke iko na ngwa anya ma mụọ ya nke ọma.Gịnị na-emetụta polishing mmetụta na polishing ntụ ntụ bụ urughuru size, ịdị ọcha na ike nke CeO2.The urughuru size bụ isi ihe.The nnukwu urughuru size bụ adabara polishing nke nkịtị ngwa anya components na spectacle anya m, mgbe obere urughuru size bụ adabara elu-ọsọ polishing nke ezi ngwa anya anya m.

Dị ka ihe atụ: Dị ka ihe kasị nkịtị na isi inorganic ihe, iko na-ọtụtụ ebe na-eji na pen-debook kọmputa hard disk iko substrates, dijitalụ igwefoto ibe, ultra-nkenke anya anya m, ngwa anya windo na ndị ọzọ ngwa anya components, yana ngwa nkwurịta okwu ngwa. ihe ngosi flat-panel na ngwa eletrọnịkị ndị ọzọ dị elu.Ultra-smooth, sub-nanometer roughness, ewepụghị iko elu na-enweghị micro-defects aghọwo ihe dị mkpa metụtara arụmọrụ nke ndị a elu-tech ngwaahịa.Chemical Mechanical polishing (CMP) bụ akụkụ dị mkpa nke nhazi silicon wafer yana usoro ntinye na etching niile na mmepụta nke sekit agbakwunyere.Ọ na-eji mmetụta polishing n'ibu nke ultrafine abrasive particles na CMP slurry na mmetụta corrosion kemịkalụ nke slurry.Diski ngwa anya na-etolite elu dị larịị nke ukwuu na wafer silicon nke emere ụkpụrụ sekit na ya.Ugbu a ọ bụ nkà na ụzụ ọhụrụ nke nwere ike inye nkwụsị zuru ụwa ọnụ na usoro mmepụta nke sekit VLSI.

(2) Nano-cerium dioxide ejiri mee ihe na-eme ka ọ dị mma nwere arụmọrụ redox dị mma.Cerium oxide nanopowder abụghị naanị nwere nchekwa oxygen pụrụ iche yana ọrụ ntọhapụ oxygen, kamakwa ọ bụ ihe na-eme ka oxide na-arụ ọrụ na usoro oxide ụwa na-adịghị ahụkebe.Ya mere, enwere ike iji nano ceria dị ka onye na-enye aka iji melite arụmọrụ catalytic nke ihe na-emepụta ihe n'ọtụtụ oge.

(3) Ceric oxide nano particle eji na ụlọ ọrụ nchara: Iji nano-cerium oxide dị ka mkpuchi na mgbakwunye nwere ike melite nguzogide oxidation, corrosion ọkụ, mmiri corrosion na vulcanization Njirimara nke elu okpomọkụ alloys na igwe anaghị agba nchara, na nwekwara ike ịbụ. eji dị ka inoculant maka ductile iron.

(4) Cerium oxide nano ntụ ntụ nwere ike iji na ultraviolet absorbing ngwaahịa n'ihi na nano CeO2 nwere ụba eletrọnịkị ike etoju, magburu onwe uche uche na ultraviolet ìhè absorption.Ejikọta ya na obere nha mmetụta, elu kpọmkwem mmetụta elu, na macroscopic quantum mmetụta nke nanoparticle, CeO2 nano nwere ike agbasasị na echiche mmetụta na ultraviolet ìhè.Ọzọkwa, CeO2 nwere ezigbo nkwụsi ike nke okpomọkụ, nchekwa na adịghị egbu egbu, ihe onwunwe dị ukwuu, na ọnụ ahịa nkwadebe dị ala, ya mere a na-atụ anya na ọ ga-abụ ụdị ọhụrụ nke ultraviolet absorber na-etinye na mpaghara dị iche iche.

Ọnọdụ Nchekwa:

Nano Cerium (IV) oxide/CeO2 Cerium oxide ntụ ntụ kwesịrị ịchekwa na mkpuchi, zere ìhè, ebe akọrọ.Nchekwa okpomọkụ ụlọ dị mma.

SEM:

cerium oxide nanoparticle


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